Using the newly calibrated model, three virtual DOEs with more than 500 simulation runs were completed to understand the effect of different manufacturing variables on void volume and bow CD. Fig. 1: ...

Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...

Bert Bras, Farrokh Mistree, Designing Design Processes in Decision-Based Concurrent Engineering, SAE Transactions, Vol. 100, Section 5: JOURNAL OF MATERIALS & MANUFACTURING (1991), pp. 1019-1040 ...

The optimize phase requires use of process capability information and a statistical approach to tolerancing. In this phase, you will develop detailed product design elements, predict performance ...

Research Journal of the Water Pollution Control Federation, Vol. 62, No. 2 (Mar. - Apr., 1990), pp. 185-192 (8 pages) The design of biofilm processes can be based on the mechanistically rigorous ...

TSMC certified Cadence® digital and custom/analog design flows for the latest TSMC N4P and N3E processes, supporting the DRM and FINFLEX technology.

Streamline processes to reduce time to market The report highlighted that respondents not currently using a PLM solution reported their R&D/engineering teams performing below projections.

Analog-synthesis tools provide great potential for speeding the design process for analog circuits. This capability is especially important in mixed-signal-system-on-chip design, in which the analog ...